%0 Journal Article
%T Shallow Trench Isolation Characteristics with High-Density-Plasma Chemical  Vapor Deposition Gap-Fill Oxide for Deep-Submicron CMOS Technologies
%A Lee, Seung-Ho
%A Son, Jeong-Hwan
%A Lee, Hi-Deok
%A Yang, Wouns
%A Lee, Young-Jong
%J Japanese Journal of Applied Physics
%V 37
%N 3S
%@ 0021-4922
%D 1998-03-01
%~ DeepDyve