%0 Journal Article
%T Masking Effect" And "Internal CEL" New Design Concepts For A Positive Working Photoresist
%A Miura, Konoe
%A Ochiai, Tameichi
%A Kameyama, Yasuhiro
%A Kashi, Chie
%A Uoya, Shigeo
%A Nakajima, Masayuki
%A Kawai, Akira
%A Kishimura, Shinji
%J Proceedings of SPIE
%V 92
%P 134-141
%@ 0277-786X
%D 1988-01-01
%I SPIE
%~ DeepDyve