%0 Journal Article
%T Selective Chemical Mechanical Polishing of Silicon Dioxide over Silicon Nitride for Shallow Trench Isolation Using Ceria Slurries
%A Dandu Veera, P. R.
%A Peddeti, Shivaji
%A Babu, S. V.
%J Journal of the Electrochemical Society
%V 156
%N 12
%P H936-H943
%@ 0013-4651
%D 2009-10-13
%~ DeepDyve