%0 Journal Article
%T Application of exposure simulation system to CD control investigation at 130-nm photolithography node
%A Huang, Yu-Kuang
%A Chen, Nien-Po
%A Chou, Jason
%J Proceedings of SPIE
%V 6607
%N 1
%P 66072B-66072B-9
%@ 0277-786X
%D 2007-05-03
%I SPIE
%~ DeepDyve