%0 Journal Article
%T Characterization of a New Cleaning Method Using Electrolytic Ionized Water    for Polysilicon Chemical Mechanical Polishing Process
%A Miyashita, Naoto
%A Uekusa, Shin-ichiro
%A Katumata, Hiroshi
%J Japanese Journal of Applied Physics
%V 41
%N 8R
%@ 0021-4922
%D 2002-08-01
%~ DeepDyve