%0 Journal Article
%T High-etch-rate bottom-antireflective coating and gap-fill materials using dextrin derivatives in via first dual-damascene lithography process
%A Takei, Satoshi
%J Proceedings of SPIE
%V 6923
%N 1
%P 69232P-69232P-8
%@ 0277-786X
%D 2008-03-14
%I SPIE
%~ DeepDyve