%0 Journal Article
%T Design of a bottom antireflective layer for optical lithography
%A Fahey, James T.
%A Moreau, Wayne M.
%A Welsh, Kevin M.
%A Miura, Steve S.
%A Eib, Nicholas K.
%A Spinillo, Gary T.
%A Sturtevant, John L.
%J Proceedings of SPIE
%V 2195
%P 422-446
%@ 0277-786X
%D 1994-05-16
%I SPIE
%~ DeepDyve