%0 Journal Article
%T An In Situ Interferometric Analysis Of Resist Development On Photomask Substrates
%A Novembre, A. E.
%A Tang, W. T.
%A Hsieh, P.
%J Proceedings of SPIE
%V 1087
%P 460-468
%@ 0277-786X
%D 1989-07-19
%I SPIE
%~ DeepDyve