%0 Journal Article
%T Highly accurate alignment technology for electron-beam lithography in mix-and-match with optical stepper
%A Nakayama, Yoshinori
%J Proceedings of SPIE
%V 3048
%N 1
%P 237-245
%@ 0277-786X
%D 1997-07-07
%I SPIE
%~ DeepDyve