%0 Journal Article
%T High resolution defect inspection of step and flash imprint lithography for 32 nm half-pitch patterning
%A McMackin, I.
%J Proceedings of SPIE
%V 6921
%N 1
%P 69211L-69211L-12
%@ 0277-786X
%D 2008-03-14
%I SPIE
%~ DeepDyve