%0 Journal Article
%T Residual‐Surfactant‐Free Photoresist Development Process
%A Shimada, H.
%A Onodera, M.
%A Shimomura, S.
%A Hirose, K.
%A Ohmi, T.
%J Journal of the Electrochemical Society
%V 139
%N 6
%P 1721-1730
%@ 0013-4651
%D 1992-06-01
%~ DeepDyve