%0 Journal Article
%T Application of polysilazane to etch mask in pattern transfer processes for deep- and vacuum-UV lithography
%A Sato, Yasuhiko
%J Proceedings of SPIE
%V 5376
%N 1
%P 951-958
%@ 0277-786X
%D 2004-05-14
%I SPIE
%~ DeepDyve