%0 Journal Article
%T Complementary double-exposure technique (CODE): a way to print 80- and 65-nm gate levels using a double-exposure binary mask approach
%A Manakli, Serdar
%A Trouiller, Yorick
%A Toublan, Olivier
%A Schiavone, Patrick
%A Rody, Yves
%A Goirand, P. J.
%J Journal of Micro/Nanolithography, MEMS and MOEMS
%V 3
%N 2
%P 305-315
%@ 1932-5150
%D 2004-04-01
%I SPIE
%~ DeepDyve