%0 Journal Article
%T Preparation of Remote Plasma Atomic Layer-Deposited HfO2 Thin Films with High Charge Trapping Densities and Their Application in Nonvolatile Memory Devices
%A Yoo, Jae-Hoon
%A Park, Won-Ji
%A Kim, So-Won
%A Lee, Ga-Ram
%A Kim, Jong-Hwan
%A Lee, Joung-Ho
%A Uhm, Sae-Hoon
%A Lee, Hee-Chul
%J Nanomaterials
%V 13
%N 11
%@ 2079-4991
%D 2023-06-01
%I Multidisciplinary Digital Publishing Institute
%~ DeepDyve