%0 Journal Article
%T Etching Characteristics and Mechanisms of TiO2 Thin Films in CF4+Ar, Cl2+Ar and HBr+Ar Inductively Coupled Plasmas
%A Lee, Junmyung
%A Efremov, Alexander
%A Lee, Byung
%A Kwon, Kwang-Ho
%J Plasma Chemistry and Plasma Processing
%V 36
%N 6
%P 1571-1588
%@ 0272-4324
%D 2016-08-02
%I Springer US
%~ DeepDyve