%0 Journal Article
%T Development of spin-on hard mask materials under resist in nano imprint lithography
%A Takei, Satoshi
%A Ogawa, Tsuyoshi
%A Hanabata, Makoto
%A Willson, C. G.
%J Proceedings of SPIE
%V 7639
%N 1
%P 76391C-76391C-8
%@ 0277-786X
%D 2010-04-09
%I SPIE
%~ DeepDyve