%0 Journal Article
%T An Autonomously Controllable Plasma Etching System Based on Radical Monitoring
%A Takahashi, Shunji
%A Kawauchi, Ryota
%A Takashima, Seigo
%A Den, Shoji
%A Katagiri, Toshiro
%A Kano, Hiroyuki
%A Ohta, Takayuki
%A Ito, Masafumi
%A Suzuki, Tatsuya
%A Takeda, Keigo
%A Hori, Masaru
%J Japanese Journal of Applied Physics
%V 51
%N 7R
%@ 0021-4922
%D 2012-07-01
%~ DeepDyve