%0 Journal Article
%T Sacrificial hardmask ALD with hydrogen peroxide: comparative study of low temperature growth and film characteristics for TiO2 and Al2O3
%A Alvarez, Daniel
%A Andachi, Keisuke
%A Tsuchibuchi, Gaku
%A Suzuki, Katsumasa
%A Spiegelman, Jeff
%J Proceedings of SPIE
%V 11326
%P 113260S-113260S-8
%@ 0277-786X
%D 2020-03-23
%I SPIE
%~ DeepDyve