%0 Journal Article
%T Boron Diffusion and Activation during Heat Treatment in Heavily Doped Polysilicon Thin Films   for P+ Metal-Oxide-Semiconductor Transistors Gates
%A Mahamdi, Ramdane
%A Mansour, Farida
%A Scheid, Emmanuel
%A Boyer, Pierre Temple
%A Jalabert, Laurent
%J Japanese Journal of Applied Physics
%V 40
%N 12R
%@ 0021-4922
%D 2001-12-01
%~ DeepDyve