%0 Journal Article
%T Fundamentals of the reaction-diffusion process in model EUV photoresists
%A Lavery, Kristopher A.
%A Choi, Kwang-Woo
%A Vogt, Bryan D.
%A Leeson, Michael J.
%J Proceedings of SPIE
%V 6153
%N 1
%P 615313-615313-8
%@ 0277-786X
%D 2006-03-10
%I SPIE
%~ DeepDyve