%0 Journal Article
%T Prediction of lithographic performance upon the adjustment of EUV photoresist components by advanced contrast curve analysis
%A Byun, Eunkyoung
%A Kim, Sukmin
%A Han, Seungwon
%A Choe, Jaehui
%A Kwon, Seongji
%A Lee, Junghoon
%A Choi, Sam-Jong
%J Proceedings of SPIE
%V 12957
%P 129571O-129571O-8
%@ 0277-786X
%D 2024-04-09
%I SPIE
%~ DeepDyve