%0 Journal Article
%T Selective atomic-level etching using two heating procedures, infrared irradiation and ion bombardment, for next-generation semiconductor device manufacturing
%A Shinoda, K
%A Miyoshi, N
%A Kobayashi, H
%A Miura, M
%A Kurihara, M
%A Maeda, K
%A Negishi, N
%A Sonoda, Y
%A Tanaka, M
%A Yasui, N
%A Izawa, M
%A Ishii, Y
%A Okuma, K
%A Saldana, T
%A Manos, J
%A Ishikawa, K
%A Hori, M
%J Journal of Physics D: Applied Physics
%V 50
%N 19
%P 13
%@ 0022-3727
%D 2017-05-17
%~ DeepDyve