%0 Journal Article
%T Control of Microscratches in Chemical-Mechanical Polishing Process for Shallow Trench Isolation
%A Park, Heungsoo
%A Kim, Kwang-Bok
%A Hong, Chang-Ki
%A Chung, U-In
%A Lee, Moon-Yong
%J Japanese Journal of Applied Physics
%V 37
%N 11R
%@ 0021-4922
%D 1998-11-01
%~ DeepDyve