%0 Journal Article
%T TiSi-nitride attenuating phase-shift photomask for 193-nm lithography
%A Reynolds, Gillian A. M.
%A Hughes, Greg P.
%A Jones, David J.
%J Proceedings of SPIE
%V 3546
%N 1
%P 514-523
%@ 0277-786X
%D 1998-12-18
%I SPIE
%~ DeepDyve