%0 Journal Article
%T Silicon Wafer CMP Slurry Using a Hydrolysis Reaction Accelerator with an Amine Functional Group Remarkably Enhances Polishing Rate
%A Bae, Jae-Young
%A Han, Man-Hyup
%A Lee, Seung-Jae
%A Kim, Eun-Seong
%A Lee, Kyungsik
%A Lee, Gon-sub
%A Park, Jin-Hyung
%A Park, Jea-Gun
%J Nanomaterials
%V 12
%N 21
%@ 2079-4991
%D 2022-11-04
%I Multidisciplinary Digital Publishing Institute
%~ DeepDyve