%0 Journal Article
%T High-power remote plasma source with alternative gas COF2 for PECVD chamber dry cleaning
%A Park, Ah Hyun
%A Byun, Hyuck
%A Hong, Sang Jeen
%J Japanese Journal of Applied Physics
%V 64
%N 4
%P 7
%@ 0021-4922
%D 2025-04-01
%I IOP Publishing
%~ DeepDyve