%0 Journal Article
%T AlO sputtered self‐aligned source/drain formation technology for highly reliable oxide thin film transistor backplane
%A Hayashi, Hiroshi
%A Murai, Atsuhito
%A Miura, Masanori
%A Imada, Tatsuo
%A Terai, Yasuhiro
%A Oshima, Yoshihiro
%A Saitoh, Tohru
%A Hiromasu, Yasunobu
%A Arai, Toshiaki
%J Journal of the Society for Information Display
%V 26
%N 10
%P 583-594
%@ 1071-0922
%D 2018-10-01
%I Wiley Subscription Services, Inc., A Wiley Company
%~ DeepDyve