%0 Journal Article
%T Impact of attenuated PSM repair for 130-nm polygate lithography process
%A Shi, Xuelong
%A Cheng, Andy
%A Wang, David
%A Chen, Dick
%A Lin, Arthur
%A Conley, Will
%A Desai, Sunil
%A Imamura, Philip H.
%J Proceedings of SPIE
%V 4344
%N 1
%P 707-715
%@ 0277-786X
%D 2001-08-22
%I SPIE
%~ DeepDyve