%0 Journal Article
%T Comparative study of DRAM cell patterning between ArF immersion and EUV lithography
%A Eom, Tae-Seung
%J Proceedings of SPIE
%V 7271
%N 1
%P 727115-727115-10
%@ 0277-786X
%D 2009-03-13
%I SPIE
%~ DeepDyve