%0 Journal Article
%T Application of atomic layer deposited Al2O3 as charge injection layer for high-permittivity dielectrics
%A Hillmann, Stephan
%A Rachut, Karsten
%A Bayer, Thorsten J M
%A Li, Shunyi
%A Klein, Andreas
%J Semiconductor Science and Technology
%V 30
%N 2
%P 7
%@ 0268-1242
%D 2015-02-01
%~ DeepDyve