%0 Journal Article
%T Photo-Assisted Chemical Mechanical Polishing of Si Wafer Using Phosphorescent Particles as a Luminescent Agent
%A Murata, Junji
%A Kagawa, Masaya
%J ECS Journal of Solid State Science and Technology
%V 8
%N 11
%@ 2162-8769
%D 2019-01-01
%~ DeepDyve