%0 Journal Article
%T A Simple and Efficient Pretreatment Technology for Selective Tungsten Deposition in Low-Pressure Chemical Vapor Deposition Reactor
%A Chang, Kow-Ming
%A Yeh, Ta-Hsun
%A Chi-Hung Li , Chi-Hung Li
%A Shih-Wei Wang 
   , Shih-Wei Wang
%J Japanese Journal of Applied Physics
%V 33
%N 12S
%@ 0021-4922
%D 1994-12-01
%~ DeepDyve