%0 Journal Article
%T A Cross‐Bridge Test Structure for Evaluating the Linewidth Uniformity of an Integrated Circuit Lithography System
%A Yen, D.
%A Linholm, L. W.
%A Buehler, M. G.
%J Journal of the Electrochemical Society
%V 129
%N 10
%P 2313-2318
%@ 0013-4651
%D 1982-10-01
%~ DeepDyve