%0 Journal Article
%T Behavior and effects of water penetration in 193-nm immersion lithography process materials
%A Niwa, Takafumi
%A Scheer, Steven
%A Enomoto, Masashi
%J Proceedings of SPIE
%V 6519
%N 1
%P 651922-651922-12
%@ 0277-786X
%D 2007-03-16
%I SPIE
%~ DeepDyve