%0 Journal Article
%T Review of resist-based flare measurement methods for extreme ultraviolet lithography
%A Sun, Lei
%A Wood, Obert R.
%A Verduijn, Erik A.
%A Singh, Mandeep
%A Wang, Wenhui
%A Kim, Ryoung-Han
%A Mangat, Pawitter
%A Koh, Hui Peng
%A Levinson, Harry J.
%J Journal of Micro/Nanolithography, MEMS and MOEMS
%V 12
%N 4
%P 042001-042001
%@ 1932-5150
%D 2013-10-01
%I SPIE
%~ DeepDyve