%0 Journal Article
%T Postsilicon Oxide Etch Cleaning Process Using Integrated Ashing and an HF Vapor Process
%A Kwon, Ohseung
%A Sawin, Herbert H.
%J Journal of the Electrochemical Society
%V 153
%N 6
%P G515-G520
%@ 0013-4651
%D 2006-04-06
%~ DeepDyve