%0 Journal Article
%T Block co-polymerized polyimide resists for KrF lithography and EB lithography with high dry etching resistance
%A Gorwadkar, Sucheta M.
%A Itatani, Hiroshi
%J Proceedings of SPIE
%V 5753
%N 1
%P 746-753
%@ 0277-786X
%D 2005-05-04
%I SPIE
%~ DeepDyve