%0 Journal Article
%T Magnetic mesa structures fabricated by reactive ion etching with CO/NH3/Xe plasma chemistry for an all-silicon quantum computer
%A Wang, Dong F
%A Takahashi, Atsushi
%A Matsumoto, Yoshinori
%A Itoh, Kohei M
%A Yamamoto, Yoshihisa
%A Ono, Takahito
%A Esashi, Masayoshi
%J Nanotechnology
%V 16
%N 6
%@ 0957-4484
%D 2005-06-01
%~ DeepDyve