%0 Journal Article
%T Process, design and optical proximity correction requirements for the 65nm device generation
%A Lucas, Kevin
%A Montgomery, Patrick
%A Litt, Lloyd C.
%A Wiaux, Vincent
%A Toublan, Olivier
%A Verhappen, Arjan
%A van Wingerden, Johannes
%A Kasprowicz, Bryan S.
%A Shiro, Eugene
%A Wimmer, Karl
%A Roman, Bernard J.
%J Proceedings of SPIE
%V 5040
%N 1
%P 408-419
%@ 0277-786X
%D 2003-06-25
%I SPIE
%~ DeepDyve