%0 Journal Article
%T Sn Etching of Extreme Ultraviolet (EUV) Mirror Surface Using Ar–H2 Atmospheric Pressure Arc Plasma Jet
%A Kim, Ju Sung
%A Choi, Jinsung
%A Hong, Young June
%A Choi, Eun Ha
%J Plasma Chemistry and Plasma Processing
%V 43
%N 5
%P 975-990
%@ 0272-4324
%D 2023-09-01
%I Springer US
%~ DeepDyve