%0 Journal Article
%T Improvement on Intrinsic Electrical Properties of Low‐k Hydrogen Silsesquioxane/Copper Interconnects Employing Deuterium Plasma Treatment
%A Liu, Po‐Tsun
%A Chang, Ting‐Chang
%A Yang, Ya‐Liang
%A Cheng, Yi‐Fang
%A Lee, Jae‐Kyun
%A Shih, Fu‐Yung
%A Tsai, Eric
%A Chen, Grace
%A Sze, Simon M.
%J Journal of the Electrochemical Society
%V 147
%N 3
%P 1186-1192
%@ 0013-4651
%D 2000-03-01
%~ DeepDyve