%0 Journal Article
%T Defectless Monolithic Low-k/Cu Interconnects Produced by Chemically Controlled Chemical Mechanical Polishing Process with In situ End-Point-Detection Technique
%A Ueki, Makoto
%A Onodera, Takahiro
%A Ishikawa, Akira
%A Hoshino, Susumu
%A Hayashi, Yoshihiro
%J Japanese Journal of Applied Physics
%V 48
%N 4S
%@ 0021-4922
%D 2009-04-01
%~ DeepDyve