%0 Journal Article
%T Full-field exposure tools for ArF immersion lithography
%A Lee, Jeung-woo
%A Shiraishi, Ken-ichi
%J Proceedings of SPIE
%V 6154
%N 1
%P 61544I-61544I-7
%@ 0277-786X
%D 2006-03-10
%I SPIE
%~ DeepDyve