%0 Journal Article
%T Optimization of line edge roughness before and after etching with photoresist in soft x-ray interference lithography
%A Tang, Zhaohui
%A Deng, Xiao
%A Cai, Yanni
%A Wang, Xinpan
%A Yang, Feng
%J Proceedings of SPIE
%V 11617
%P 116172N-116172N-8
%@ 0277-786X
%D 2020-12-04
%I SPIE
%~ DeepDyve