%0 Journal Article
%T Photoresist ashing technology using N2/O2 ferrite-core ICP in the dual damascene process
%A Kim, Hyoun Woo
%A Myung, Ju Hyun
%A Lee, Jong Woo
%A Kim, Hyung-Sun
%A Kim, Keeho
%A Jang, Jeong-Yeol
%A Yoon, Tae-Ho
%A Kim, Sung
%A Choi, Dae-Kyu
%A Chung, Chin-Wook
%A Yeom, Geun
%A Myoung, Jae-Min
%A Kim, Hyoung-June
%J Journal of Materials Science
%V 41
%N 15
%P 5040-5042
%@ 0022-2461
%D 2006-05-27
%I Springer US
%~ DeepDyve