%0 Journal Article
%T Variable development response of resists using electron beam lithography: Methods and applications
%A Henderson, R. C.
%A Pease, R. F. W.
%J Polymer Engineering & Science
%V 14
%N 7
%P 538-541
%@ 0032-3888
%D 1974-07-01
%I Wiley Subscription Services, Inc., A Wiley Company
%~ DeepDyve