%0 Journal Article
%T Design and performance of photoresist materials for ArF lithography
%A Kim, Hyun-Woo
%A Kavanagh, Robert J.
%J Proceedings of SPIE
%V 4345
%N 1
%P 776-783
%@ 0277-786X
%D 2001-08-24
%I SPIE
%~ DeepDyve