%0 Journal Article
%T Ultrathin Resist Pattern Transfer Process by Filling Mask Material in the Resist Pattern
%A Kato, Hirokazu
%A Matsunaga, Kentaro
%A Abe, Junko
%A Onishi, Yasunobu
%J Japanese Journal of Applied Physics
%V 42
%N 6S
%@ 0021-4922
%D 2003-06-01
%~ DeepDyve