%0 Journal Article
%T Study of selective isotropic etching Si1−xGex in process of nanowire transistors
%A Li, Junjie
%A Wang, Wenwu
%A Li, Yongliang
%A Zhou, Na
%A Wang, Guilei
%A Kong, Zhenzhen
%A Fu, Jianyu
%A Yin, Xiaogen
%A Li, Chen
%A Wang, Xiaolei
%A Yang, Hong
%A Ma, Xueli
%A Han, Jianghao
%A Zhang, Jing
%A Wei, Yijun
%A Hu, Tairan
%A Yang, Tao
%A Li, Junfeng
%A Yin, Huaxiang
%A Zhu, Huilong
%A Radamson, Henry H.
%J Journal of Materials Science: Materials in Electronics
%V 31
%N 1
%P 134-143
%@ 0957-4522
%D 2020-01-05
%I Springer US
%~ DeepDyve