%0 Journal Article
%T Electrostatic risk to reticles in the nanolithography era
%A Rider, Gavin C.
%A ,
%J Journal of Micro/Nanolithography, MEMS and MOEMS
%V 15
%N 2
%P 023501-023501
%@ 1932-5150
%D 2016-04-01
%I SPIE
%~ DeepDyve